| year | 2012 |
| author(s) | Christoph Cremer |
| title | Optics Far Beyond the Diffraction Limit |
| KIP-Nummer | HD-KIP 12-72 |
| KIP-Gruppe(n) | F2 |
| document type | Paper |
| source | Springer Handbook of Lasers and Optics |
| doi | DOI 10.1007/978-3-642-19409-2 |
| Abstract (en) | New developments in far-field light microscopy made possible to radically overcome the diffraction limit (ca. 200nm laterally, 600 nm along the optical axis) of conventional far field microscopy. Here, three principal nanoscopy families are presented: Nanoscopy based on highly focused laser beams, such as 4 Pi-, and STED (stimulated emission depletion) microscopy; nanoscopy based on structured illumination excitation (SIE); and nanoscopy allowing superresolution even in the case of homogeneous excitation (spectrally assigned localization microscopy/SALM): With such techniques, it has become possible to analyze the spatial distribution of fluorescent molecules witha greatly increase light optical resolution downto a few nanometers (≈ 1/100 of the exciting wavelength). |
