High-pressure crystal growth furnace

 

The group applies a unique high-pressure traveling-solvent floating-zone furnace. The device offers growth conditions particularly devoted to Li-based single crystals where volatilization of Li is a major problem but may be suppressed by high external gas pressure. The device at U Heidelberg is the first which has been commercially delivered to academic research world-wide.

 

Relevant parameters of the high-pressure furnace

  • Ar and O2 pressure up to 150 bar
  • high pressure argon purification
  • controlled gas flow
  • oxygen-tight sealings
  • pressure range down to 0.1 mbar
  • in-situ temperature control
  • growth speed 0.01 - 2000 mm/h
  • rotation speed 0-150 rpm
  • arc lamps 5 and 7 kW
  • temperatures up to >2700 °C

 

The device has been funded by Deutsche Forschungsgemeinschaft within SPP 1473 WeNDeLIB (KL 1824/5-1)   

Selected publications on single crystal growth (2010 - )

 
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