Jahr | 1998 |
Autor(en) | C. Keller, R. Abfalterer, S. Bernet, M.K. Oberthaler, J. Schmiedmayer and A. Zeilinger |
Titel | Absorptive masks of light: A useful tool for spatial probing in atom optics |
KIP-Nummer | HD-KIP 98-13 |
KIP-Gruppe(n) | F17,S1 |
Dokumentart | Paper |
Keywords (angezeigt) | Absorptive masks useful tool spatial probing |
Quelle | Journal of Vacuum Science & Technology B 16 (1998) 3850 |
Abstract (en) | We demonstrate periodic localization of neutral atoms of better than 65 nm behind amplitude, i.e., absorptive masks made of light. With these masks, produced by a standing on resonant light wave, it is possible to create and to probe spatially well-defined atomic distributions. Applications of such absorptive masks range from atom lithography to fundamental atom optical experiments. As two examples we show how to use these gratings as a tool to measure the evolution of an atomic wave field behind a static Bragg crystal and its dependence on the incidence angle of the atomic beam and how to demonstrate the frequency shift of atoms diffracted at a modulated Bragg crystal in a beating experiment. |
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