KIP-Veröffentlichungen

Jahr 1998
Autor(en) C. Keller, R. Abfalterer, S. Bernet, M.K. Oberthaler, J. Schmiedmayer and A. Zeilinger
Titel Absorptive masks of light: A useful tool for spatial probing in atom optics
KIP-Nummer HD-KIP 98-13
KIP-Gruppe(n) F17,S1
Dokumentart Paper
Keywords (angezeigt) Absorptive masks useful tool spatial probing
Quelle Journal of Vacuum Science & Technology B 16 (1998) 3850
Abstract (en)

We demonstrate periodic localization of neutral atoms of better than 65 nm behind amplitude, i.e., absorptive masks made of light. With these masks, produced by a standing on resonant light wave, it is possible to create and to probe spatially well-defined atomic distributions. Applications of such absorptive masks range from atom lithography to fundamental atom optical experiments. As two examples we show how to use these gratings as a tool to measure the evolution of an atomic wave field behind a static Bragg crystal and its dependence on the incidence angle of the atomic beam and how to demonstrate the frequency shift of atoms diffracted at a modulated Bragg crystal in a beating experiment.

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